Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth
Nanotechnology 22 (2011) 145305
Abstract
A new method of direct, rapid nano- to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl \( \mathrm{Co_{2}(CO)_{8}}\) is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75°C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity, \( 22~{\mu\Omega}~\mathrm{cm} \), and saturation magnetization, 1.55 T, are much closer to the corresponding values for bulk Co than those for standard EBID.